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Atomic Layer Deposition as enabling ultrathin film technology for nanoscale devices

時(shí)間:2017-12-25 來源: 作者: 攝影: 編輯: 上傳:

        主講人:Prof. Se-Hun Kwon

        時(shí)間:12月29日星期五下午14:00

        地點(diǎn):科技創(chuàng)新大樓A506報(bào)告廳

        主講人介紹:

        Prof. Se-Hun Kwon is a Professor of School of Materials Science and Engineering at Pusan National University (PNU), Republic of Korea. He received his B.S, M.S., Ph. D, and postdoctoral associate in Materials Science and Engineering at Korea Advanced Institute of Science and Technology (KAIST). His research group, “Surface Materials Lab”, is focusing on the design and synthesis of functional thin films using atomic layer deposition (ALD) techniques and on the fabrication of nanostructures for semiconductors, energy storages, and other various nanodevices by utilizing a hybrid bottom-up and top-down fabrication approaches. His research bridges many disciplines and his research group has collaborators in the Department of Materials Science and Technology, Nano Science and Technology, Chemistry, and Medical Science on campus and many others at universities and industries off campus.

主辦單位:材料化學(xué)工程國家重點(diǎn)實(shí)驗(yàn)室

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